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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">pimi</journal-id><journal-title-group><journal-title xml:lang="ru">Приборы и методы измерений</journal-title><trans-title-group xml:lang="en"><trans-title>Devices and Methods of Measurements</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2220-9506</issn><issn pub-type="epub">2414-0473</issn><publisher><publisher-name>BNTU</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.21122/2220-9506-2025-16-4-306-314</article-id><article-id custom-type="elpub" pub-id-type="custom">pimi-999</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Средства измерений</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>Measuring instruments</subject></subj-group></article-categories><title-group><article-title>Концепция построения интегрального оптического датчика давления</article-title><trans-title-group xml:lang="en"><trans-title>A Concept of an Integral Optical Pressure Sensor</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Барбин</surname><given-names>Е. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Barbin</surname><given-names>E. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>пр-т Ленина, 40,г. Томск 634034</p></bio><bio xml:lang="en"><p>Lenin Ave., 40, Tomsk 634034</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Баранов</surname><given-names>П. Ф.</given-names></name><name name-style="western" xml:lang="en"><surname>Baranov</surname><given-names>P. F.</given-names></name></name-alternatives><bio xml:lang="ru"><p>пр-т Ленина, 30, г. Томск 634050</p></bio><bio xml:lang="en"><p>Lenin Ave., 30, Tomsk 634050</p></bio><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ильященко</surname><given-names>Д. П.</given-names></name><name name-style="western" xml:lang="en"><surname>Ilyaschenko</surname><given-names>D. P.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Адрес для переписки: Национальный исследовательский Томский политехнический университет,пр-т Ленина, 30, г. Томск 634050,Россияmita8@tpu.ru </p></bio><bio xml:lang="en"><p>Address for correspondence:National Research Tomsk Polytechnic University,Lenin Ave., 30,Tomsk 634050, Russiamita8@tpu.ru</p></bio><email xlink:type="simple">mita8@tpu.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Нестеренко</surname><given-names>Т. Г.</given-names></name><name name-style="western" xml:lang="en"><surname>Nesterenko</surname><given-names>T. G.</given-names></name></name-alternatives><bio xml:lang="ru"><p>пр-т Ленина, 40, г. Томск 634034</p></bio><bio xml:lang="en"><p>Lenin Ave., 40, Tomsk 634034, </p></bio><xref ref-type="aff" rid="aff-3"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Вторушин</surname><given-names>С. Е.</given-names></name><name name-style="western" xml:lang="en"><surname>Vtorushin</surname><given-names>S. E.</given-names></name></name-alternatives><bio xml:lang="ru"><p>пр-т Ленина, 40, г. Томск 634034</p></bio><bio xml:lang="en"><p>Lenin Ave., 40, Tomsk 634034</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Таловская</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Talovskaya</surname><given-names>A. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>пр-т Ленина, 40, г. Томск 634034</p></bio><bio xml:lang="en"><p>Lenin Ave., 40,Tomsk 634034</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Томский государственный университет систем управления и радиоэлектроники</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Tomsk State University of Control Systems and Radioelectronics</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Национальный исследовательский Томский политехнический университет</institution><country>Россия</country></aff><aff xml:lang="en"><institution>National Research Tomsk Polytechnic University</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-3"><aff xml:lang="ru"><institution>Томский государственный университет систем управления и радиоэлектроники;&#13;
Национальный исследовательский Томский политехнический университет</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Tomsk State University of Control Systems and Radioelectronics&#13;
National Research Tomsk Polytechnic University</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2025</year></pub-date><pub-date pub-type="epub"><day>24</day><month>12</month><year>2025</year></pub-date><volume>16</volume><issue>4</issue><fpage>306</fpage><lpage>314</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Барбин Е.С., Баранов П.Ф., Ильященко Д.П., Нестеренко Т.Г., Вторушин С.Е., Таловская А.А., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Барбин Е.С., Баранов П.Ф., Ильященко Д.П., Нестеренко Т.Г., Вторушин С.Е., Таловская А.А.</copyright-holder><copyright-holder xml:lang="en">Barbin E.S., Baranov P.F., Ilyaschenko D.P., Nesterenko T.G., Vtorushin S.E., Talovskaya A.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://pimi.bntu.by/jour/article/view/999">https://pimi.bntu.by/jour/article/view/999</self-uri><abstract><p>Расширение области применения автоматизированных систем требует разработки и исследований новых типов датчиков, способных работать в специальных условиях. Одними из распространённых сенсоров являются микроэлектромеханические датчики давления. Датчик давления содержит мембрану из кремния, которая деформируется при приложении к ней давления среды, и измерительный преобразователь деформации в электрический сигнал. Наиболее перспективным и технологичным интегральным типом преобразователя для микроэлектромеханических датчиков давления является измерительный преобразователь на основе эффекта оптического туннелирования, который основан на изменении интенсивности света, проходящего через зазор между двумя оптическими волноводами при деформации мембраны, что обеспечивает высокую чувствительность и широкий динамический диапазон датчика. Целью работы являлась разработка концепции построения чувствительного элемента микроэлектромеханического датчика давления с оптическим туннельным преобразователем. Технология создания микрооптоэлектромеханического датчика давления представляет собой поэтапное формирования заданных структур на двух пластинах с последующим их соединением. На нижней пластине формируется мембрана и волноводные структуры, на верхней – стопперы и волноводные структуры. Рассмотрено два варианта выполнения волноводов: из нитрида кремния методом плазмохимического осаждения или из кремния на готовой SOI платине. Определены основные характеристики (потери, зависимости коэффициентов передачи от длины и ширины волноводов, зазора, длины связи) датчика давления. Рабочий участок, на котором оптический датчик может измерять перемещения мембраны, пропорциональные действующему давлению, лежит в пределах от 500 ± 80 нм для SOI, и 600 ± 80 нм для Si3N4. Оптический коэффициент передачи меняется в диапазоне от 0 до 0,86 для SOI и от 0,09 до 0,53 для Si3N4 , соответственно. Требованием к мембране можно считать, что её деформация во всем диапазоне давлений должна лежать в диапазоне до 80 нм.</p></abstract><trans-abstract xml:lang="en"><p>Today, an expanding application of automatic systems demands research and development of novel types of sensors suitable for special conditions. Specifically, microelectromechanical pressure sensors are among of the most widely implemented devices. A pressure sensor comprises a silicon membrane that deforms under pressure of the medium and a measuring transducer that converts the deformation into electrical signal. The most promising and technologically advanced type of transducers for microelectromechanical pressure sensors are evanescent coupling-based transducers that implement light intensity passing through the gap between two optical waveguides varying under membrane deformation. Such scheme provides high sensitivity and extended dynamic range of the sensor. The paper is aimed at developing a design concept for the sensing element of a microelectromechanical pressure sensor with an evanescent coupling-based transducer. The technology for micro-optoelectromechanical sensor fabrication bases on a stepwise formation of the structures on two silicon on insulator wafers with their consequent bonding. The membrane is formed on the bottom wafer. The top wafer comprises stoppers. The waveguide structures are formed on both the wafers. We consider two methods of waveguide fabrication. First, they can be built up from silicon nitride by plasma-enhanced chemical vapor deposition. Second, they can be etched directly in the silicon wafer. The main characteristics of the pressure sensor are determined: losses, dependencies of the transmission coefficients on the length and width of the waveguides, gap, coupling length. The working range, where the optical transducer can measure membrane displacements proportional to the acting pressure reached 500 ± 80 nm for the silicon on insulator waveguide and 600 ± 80 nm for the Si3N4 waveguide. The optical transmission coefficient ranges from 0 to 0.86 for the silicon on insulator waveguide and from 0.09 to 0.53 for the Si3N4 waveguide. The main requirement to the membrane is assumed that its deformation does not exceed 80 nm.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>датчик давления</kwd><kwd>оптические волноводы</kwd><kwd>направленный ответвитель</kwd></kwd-group><kwd-group xml:lang="en"><kwd>pressure sensor</kwd><kwd>optical waveguides</kwd><kwd>directional coupler</kwd></kwd-group><funding-group><funding-statement xml:lang="en">The results were obtained with the support of the Ministry of Science and Higher Education of the Russian Federation (theme No. FEWM-2024-0008).</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Bhat KN, Nayak MM. MEMS Pressure SensorsAn Overview of Challenges in Technology and Packaging. Inst. Smart Struct. Syst. J. Isss J. Isss. 2012;1(1).</mixed-citation><mixed-citation xml:lang="en">Bhat KN, Nayak MM. MEMS Pressure SensorsAn Overview of Challenges in Technology and Packaging. Inst. Smart Struct. Syst. J. Isss J. Isss. 2012;1(1).</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Barlian AA, Park W-T, Mallon JR, Rastegar AJ, Pruitt BL. Review: Semiconductor Piezoresistance for Microsystems. Proceedings of the IEEE, 2009;97(3):513552. DOI:10.1109/JPROC.2009.2013612</mixed-citation><mixed-citation xml:lang="en">Barlian AA, Park W-T, Mallon JR, Rastegar AJ, Pruitt BL. Review: Semiconductor Piezoresistance for Microsystems. Proceedings of the IEEE, 2009;97(3):513552. https://doi.org/10.1109/JPROC.2009.2013612</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Kanekal D, Jindal SK. Investigation of MEMS Piezoresistive Pressure Sensor with a Freely Supported Rectangular Silicon Carbide Diaphragm as a Primary Sensing Element for Altitudinal Applications. Silicon 15, 2023;15(4):1947-1959. DOI: 10.1007/s12633-022-02146-z</mixed-citation><mixed-citation xml:lang="en">Kanekal D, Jindal SK. Investigation of MEMS Piezoresistive Pressure Sensor with a Freely Supported Rectangular Silicon Carbide Diaphragm as a Primary Sensing Element for Altitudinal Applications. Silicon 15, 2023;15(4):1947-1959. DOI: 10.1007/s12633-022-02146-z</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">Kyoung-Ho Ha, Heeyong Huh, Zhengjie Li, Nanshu Lu. Soft Capacitive Pressure Sensors: Trends, Challenges, and Perspectives. ACS Nano. 2022;16(3):34423448.</mixed-citation><mixed-citation xml:lang="en">Kyoung-Ho Ha, Heeyong Huh, Zhengjie Li, Nanshu Lu. Soft Capacitive Pressure Sensors: Trends, Challenges, and Perspectives. ACS Nano. 2022;16(3):34423448.</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Kim H, Jeong YG, Chun K. Improvement of the linearity of a capacitive pressure sensor using an interdigitated electrode structure. Sensors Actuators, A Phys. 1997;62(1–3):586-590.</mixed-citation><mixed-citation xml:lang="en">Kim H, Jeong YG, Chun K. Improvement of the linearity of a capacitive pressure sensor using an interdigitated electrode structure. Sensors Actuators, A Phys. 1997;62(1–3):586-590.</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">Shahiri Tabarestani M. Analytical Analysis of Capacitive Pressure Sensor with Clamped Diaphragm. Int. J. Eng. 2013;26(3):297-302.</mixed-citation><mixed-citation xml:lang="en">Shahiri Tabarestani M. Analytical Analysis of Capacitive Pressure Sensor with Clamped Diaphragm. Int. J. Eng. 2013;26(3):297-302.</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">Jang M, Yun K-S. MEMS capacitive pressure sensor monolithically integrated with CMOS readout circuit by using post CMOS processes. Micro and Nano Systems Letters. 2017;5(1):4 р. DOI: 10.1186/s40486-016-0037-3</mixed-citation><mixed-citation xml:lang="en">Jang M, Yun K-S. MEMS capacitive pressure sensor monolithically integrated with CMOS readout circuit by using post CMOS processes. Micro and Nano Systems Letters. 2017;5(1):4 р. DOI: 10.1186/s40486-016-0037-3</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">Boukabache A. [et al.]. Characterization and modelling of the mismatch of TCRs and their effects on the drift of the offset voltage of piezoresistive pressure sensors. Sensors Actuators, A Phys. 2000;84(3):292-296. DOI: 10.1016/S0924-4247(00)00406-4</mixed-citation><mixed-citation xml:lang="en">Boukabache A. [et al.]. Characterization and modelling of the mismatch of TCRs and their effects on the drift of the offset voltage of piezoresistive pressure sensors. Sensors Actuators, A Phys. 2000;84(3):292-296. DOI: 10.1016/S0924-4247(00)00406-4</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Belwanshi V. Analytical modeling to estimate the sensitivity of MEMS technology-based piezoresistive pressure sensor. J Comput Electron. 2021;(20):668-680. DOI: 10.1007/s10825-020-01592-5</mixed-citation><mixed-citation xml:lang="en">Belwanshi V. Analytical modeling to estimate the sensitivity of MEMS technology-based piezoresistive pressure sensor. J Comput Electron. 2021;(20):668-680. DOI: 10.1007/s10825-020-01592-5</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">Tian B, Shang H, Zhao L [et al.]. Performance optimization of SiC piezoresistive pressure sensor through suitable piezoresistor design. Microsyst Technol. 2021;(27):3083-3093. DOI: 10.1007/s00542-020-05175-z</mixed-citation><mixed-citation xml:lang="en">Tian B, Shang H, Zhao L [et al.]. Performance optimization of SiC piezoresistive pressure sensor through suitable piezoresistor design. Microsyst Technol. 2021;(27):3083-3093. DOI: 10.1007/s00542-020-05175-z</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">Kumar SS, Pant BD. Design principles and considerations for the “ideal” silicon piezoresistive pressure sensor: a focused review. Microsystem Technologies. 2014;20(7):1213-1247. DOI: 10.1007/s00542-014-2215-7</mixed-citation><mixed-citation xml:lang="en">Kumar SS, Pant BD. Design principles and considerations for the “ideal” silicon piezoresistive pressure sensor: a focused review. Microsystem Technologies. 2014;20(7):1213-1247. DOI: 10.1007/s00542-014-2215-7</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">Park S-H, Lee HB, Yeon SM, Park J, Lee NK. Flexible and Stretchable Piezoelectric Sensor with Thickness-Tunable Configuration of Electrospun Nanofiber Mat and Elastomeric Substrates. ACS Applied Materials &amp; Interfaces. 2016;8(37): 24773-24781. DOI: 10.1021/acsami.6b07833</mixed-citation><mixed-citation xml:lang="en">Park S-H, Lee HB, Yeon SM, Park J, Lee NK. Flexible and Stretchable Piezoelectric Sensor with Thickness-Tunable Configuration of Electrospun Nanofiber Mat and Elastomeric Substrates. ACS Applied Materials &amp; Interfaces. 2016;8(37): 24773-24781. DOI: 10.1021/acsami.6b07833</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">Qian P, Yu Z, Yu J. [et al.]. A resonant high-pressure microsensor based on a composite pressure-sensitive mechanism of diaphragm bending and volume compression. Microsyst Nanoeng. 2024;10:38 p. DOI: 10.1038/s41378-024-00667-8</mixed-citation><mixed-citation xml:lang="en">Qian P, Yu Z, Yu J. [et al.]. A resonant high-pressure microsensor based on a composite pressure-sensitive mechanism of diaphragm bending and volume compression. Microsyst Nanoeng. 2024;10:38 p. DOI: 10.1038/s41378-024-00667-8</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">Yulan Lu, Pengcheng Yan, Chao Xiang, Deyong Chen, Junbo Wang, Bo Xie and Jian Chen. A Resonant Pressure Microsensor with the Measurement Range of 1 MPa Based on Sensitivities Balanced Dual Resonators. Sensors. 2019;19(10):2272. DOI: 10.3390/s19102272</mixed-citation><mixed-citation xml:lang="en">Yulan Lu, Pengcheng Yan, Chao Xiang, Deyong Chen, Junbo Wang, Bo Xie and Jian Chen. A Resonant Pressure Microsensor with the Measurement Range of 1 MPa Based on Sensitivities Balanced Dual Resonators. Sensors. 2019;19(10):2272. DOI: 10.3390/s19102272</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">Yu J. [et al.]. A resonant high pressure sensor based on dual cavities design. IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS). 2021;1725-1728 p.</mixed-citation><mixed-citation xml:lang="en">Yu J. [et al.]. A resonant high pressure sensor based on dual cavities design. IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS). 2021;1725-1728 p.</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">Mitsuhashi T. [et al.]. A resonant pressure sensor with super high resolution and stability based on novel volume shrinkage method. in Transducers. 22nd International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers) 2023. JAPAN.</mixed-citation><mixed-citation xml:lang="en">Mitsuhashi T. [et al.]. A resonant pressure sensor with super high resolution and stability based on novel volume shrinkage method. in Transducers. 22nd International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers) 2023. JAPAN.</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">Deyong Chen, Dafu Cui, Shanhong Xia Zheng Cui. Design and Modeling of a Silicon Nitride Beam Resonant Pressure Sensor for Temperature Compensation. Proceedings of the 2005 IEEE International Conference on Information Acquisition. 2005.</mixed-citation><mixed-citation xml:lang="en">Deyong Chen, Dafu Cui, Shanhong Xia Zheng Cui. Design and Modeling of a Silicon Nitride Beam Resonant Pressure Sensor for Temperature Compensation. Proceedings of the 2005 IEEE International Conference on Information Acquisition. 2005.</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">Xu MG, Geiger H, Dakin JP. Fibre grating pressure sensor with enhanced sensitivity using a glass-bubble housing. Electronics Letters. 1996;32(2). DOI: 10.1049/el:19960022</mixed-citation><mixed-citation xml:lang="en">Xu MG, Geiger H, Dakin JP. Fibre grating pressure sensor with enhanced sensitivity using a glass-bubble housing. Electronics Letters. 1996;32(2). DOI: 10.1049/el:19960022</mixed-citation></citation-alternatives></ref><ref id="cit19"><label>19</label><citation-alternatives><mixed-citation xml:lang="ru">Arkwright JW [et al.]. Fiber Optic Pressure Sensing Arrays for Monitoring Horizontal and Vertical Pressures Generated by Traveling Water Waves. IEEE Sensors Journal. 2014;14(8):2739-2742. DOI: 10.1109/jsen.2014.2311806</mixed-citation><mixed-citation xml:lang="en">Arkwright JW [et al.]. Fiber Optic Pressure Sensing Arrays for Monitoring Horizontal and Vertical Pressures Generated by Traveling Water Waves. IEEE Sensors Journal. 2014;14(8):2739-2742. DOI: 10.1109/jsen.2014.2311806</mixed-citation></citation-alternatives></ref><ref id="cit20"><label>20</label><citation-alternatives><mixed-citation xml:lang="ru">Wang Y, Wang DN, Wang C, Hu T. Compressible fiber optic micro-Fabry-Pérot cavity with ultra-high pressure sensitivity. Optics Express. 2013;21(12):14084. DOI: 10.1364/oe.21.014084</mixed-citation><mixed-citation xml:lang="en">Wang Y, Wang DN, Wang C, Hu T. Compressible fiber optic micro-Fabry-Pérot cavity with ultra-high pressure sensitivity. Optics Express. 2013;21(12):14084. DOI:10.1364/oe.21.014084</mixed-citation></citation-alternatives></ref><ref id="cit21"><label>21</label><citation-alternatives><mixed-citation xml:lang="ru">Yizheng Zhu, Anbo Wang. Miniature fiber-optic pressure sensor. IEEE Photonics Technology Letters. 2005;17(2):447-449. DOI: 10.1109/lpt.2004.839002</mixed-citation><mixed-citation xml:lang="en">Yizheng Zhu, Anbo Wang. Miniature fiber-optic pressure sensor. IEEE Photonics Technology Letters. 2005;17(2):447-449. DOI: 10.1109/lpt.2004.839002</mixed-citation></citation-alternatives></ref><ref id="cit22"><label>22</label><citation-alternatives><mixed-citation xml:lang="ru">Cibula E, Donlagic D, Stropnik C. (n.d.). Miniature fiber optic pressure sensor for medical applications. Proceedings of IEEE Sensors. 2002;(1):711-714. DOI:10.1109/ICSENS.2002.1037190</mixed-citation><mixed-citation xml:lang="en">Cibula E, Donlagic D, Stropnik C. (n.d.). Miniature fiber optic pressure sensor for medical applications. Proceedings of IEEE Sensors. 2002;(1):711-714. https://doi.org/10.1109/ICSENS.2002.1037190</mixed-citation></citation-alternatives></ref><ref id="cit23"><label>23</label><citation-alternatives><mixed-citation xml:lang="ru">Evgenii Barbin [et al.]. The Design, Modeling and Experimental Investigation of a Micro-G Microoptoelectromechanical Accelerometer with an Optical Tunneling Measuring Transducer. Sensors. 2024;24(3):765 p. DOI: 10.3390/s24030765</mixed-citation><mixed-citation xml:lang="en">Evgenii Barbin [et al.]. The Design, Modeling and Experimental Investigation of a Micro-G Microoptoelectromechanical Accelerometer with an Optical Tunneling Measuring Transducer. Sensors. 2024;24(3):765 p. DOI: 10.3390/s24030765</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
